CALCULATIONS OF THE SPUTTERING YIELD OF SOME ELEMENTS WHEN BOMBARDED WITH NITROGEN IONS
Expanded calculations of the objective sputtering process were completed(Copper, Zinc, Silver, Cesium, Barium) bombarded with nitrogen ions, the calculations were included changing the input parameters for the energy of nitrogen ions and their incidence angle of the target. The program has employed TRIM to perform these calculations. The sputtering yield is directly dependent on these parameters, as changing the incidence angles of the nitrogen ion beam and its energy lead to a tangible change in the output of the perfusion yield. With regard to the target in terms of the thickness of its bombarded layer by proving the parameters of the ions have a direct effect on the atomization yield. The input parameters of the falling ion beam were changed as well as the target to see how they affect the sputtering yield. We found in this study that the best angles of incidence for these ions are when they are close to the angle of 800 and that the higher the energy of the falling ions, the greater the sputtering yield.
Keywords: Sputtering Yield, TRIM Program, Nitrogen Ions.